Performance Analysis of Compound III-V Semiconductor Materials based MOSFET
Author:
Affiliation:
1. Indian Institute of Technology (IIT-ISM),Department of Electronics Engineering,Dhanbad Dhanbad,Jharkhand,India
2. BIT Mesra,Department of Electronics and Communication Engineering,Ranchi,Jharkhand,India
Funder
Department of Science and Technology
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9986304/9986356/09986476.pdf?arnumber=9986476
Reference14 articles.
1. Double-gate CMOS: symmetrical- versus asymmetrical-gate devices
2. Millimeter-Wave Vertical III-V Nanowire MOSFET Device-to-Circuit Co-Design
3. Benchmarking of III–V n-MOSFET Maturity and Feasibility for Future CMOS
4. High performance III-V MOSFETs: a dream close to reality?
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