Embedding Statistical Variability Into Propagation Delay Time Compact Models Using Different Parameter Sets: A Comparative Study in 35-nm Technology
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/8386725/08360767.pdf?arnumber=8360767
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. TCAD-Based Investigation of Statistical Variability Immunity in U-Channel FDSOI n-MOSFET for Sub-7-nm Technology;IEEE Transactions on Electron Devices;2021-06
2. Statistical Strategies to Capture Correlation Between Overshooting Effect and Propagation Delay Time in Nano-CMOS Inverters;IEEE Access;2021
3. Impact of nano-Scale Statistical Variability on SRAM Stability: A Comparative Study between 6T and 8T Cells;J NANOSTRUCT;2021
4. Statistical Strategies to Reproduce the Propagation Delay Time Variability Using Compact Models;IEEE Transactions on Circuits and Systems II: Express Briefs;2019-11
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