An Anti-Plasma Etching Film of Y<sub>2</sub>O<sub>3</sub> Film-Reference-Cited by-同舟云学术

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An Anti-Plasma Etching Film of Y₂O₃ Film

Published:2024-04-17 Issue: Volume: Page:87-89
ISSN:
Container-title:2024 10th International Conference on Applied System Innovation (ICASI)
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Author:

Wei Chia-Chih¹,Chen Hsuan-Jung²,Lee Yi-Mu³,Chang Shao-Fu⁴,Chen Chien-Chon⁴

Affiliation:

1. College of Engineering and Science, Ph.D. Program in Materials and Chemical Engineering, National United University,Miaoli,Taiwan

2. Michigan State University,Department of Chemistry,MI,USA,48824

3. National United University,Department of Electronic,Miaoli,Taiwan

4. National United University,Department of Energy Engineering,Miaoli,Taiwan

Funder

Chung-Shan Institute of Science and Technology

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx8/10547719/10547721/10547891.pdf?arnumber=10547891

Reference12 articles.

1. Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

2. Yttrium Oxyfluoride Coatings Deposited by Suspension Plasma Spraying Using Coaxial Feeding

3. Solid-State Synthesis of Yttirum Oxyfluoride Powders and Their Application to Suspension Plasma Spray Coating

4. Recent developments in arc spraying

5. Analysis of wire arc spraying process variables on coatings properties

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