Impact of Technology Scaling in DSM Region on Performance of Intercalation-doped MLGNR as VLSI Interconnects-Reference-Cited by-同舟云学术

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Impact of Technology Scaling in DSM Region on Performance of Intercalation-doped MLGNR as VLSI Interconnects

Published:2023-02-24 Issue: Volume: Page:
ISSN:
Container-title:2023 2nd Edition of IEEE Delhi Section Flagship Conference (DELCON)
language:
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Author:

Kaur Tajinder¹,Rai Mayank Kumar²,Khanna Rajesh²

Affiliation:

1. Chitkara University Institute of Engineering and Technology Chitkara University,Department of Interdisciplinary Courses in Engineering,Rajpura,India

2. Thapar Institute of Engineering And Technology,Electronics and Communication Engineering,Patiala,India

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10127221/10127228/10127300.pdf?arnumber=10127300

Reference19 articles.

1. Analytical Time-Domain Models for Performance Optimization of Multilayer GNR Interconnects

2. Dependence of field-emission threshold in diamond-like carbon films grown by various techniques

3. Evaluation of the Potential Performance of Graphene Nanoribbons as On-Chip Interconnects

4. Lithium-Intercalated Graphene Interconnects: Prospects for On-Chip Applications

5. Electron field-emission from diamond-like carbon films grown by a saddle field fast atom beam source

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