Sacrificial layer SiO/sub 2/ wet etching for micromachining applications
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx2/505/3940/00148963.pdf?arnumber=148963
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optical Characterization of Anodically Grown Silicon Dioxide Thin Films;Physics of Semiconductor Devices;2014
2. Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films;The Scientific World Journal;2014
3. Novel vapor texturing method for EFG silicon solar cell applications;Solar Energy Materials and Solar Cells;2012-12
4. Fabrication of GaAs-on-Insulator via Low Temperature Wafer Bonding and Sacrificial Etching of Ge by XeF2;Journal of The Electrochemical Society;2011
5. The sacrificial oxide etching of poly-Si cantilevers having high aspect ratios using supercritical CO2;Microelectronic Engineering;2010-11
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