Extreme Temperature (> 200 °C), Radiation Hard (> 1 Mrad), Dense (sub-50 nm CD), Fast (2 ns write pulses), Non-Volatile Memory Technology
Author:
Affiliation:
1. Cerfe Labs,Clovis,CA,USA
2. Cerfe Labs,Austin,TX,USA
3. Cerfe Labs,Dallas,TX,USA
4. Cerfe Labs,Cupertino,CA,USA
5. Cerfe Labs,Palo Alto,CA,USA
6. Cerfe Labs,San Jose,CA,USA
Funder
AFRL
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9779263/9779243/09779251.pdf?arnumber=9779251
Reference5 articles.
1. Universal Non-Power Switching in Carbon-Doped Transition Metal Oxides (TMO) and Post TMO;de araujo;Review,2022
2. Highly stable, extremely high-temperature, nonvolatile memory based on resistance switching in polycrystalline Pt nanogaps
3. Device characterization of correlated electron random access memories
4. High temperature electronics using SiC: actual situation and unsolved problems
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