Design and Analysis of a New Excitation Structure for Magnetron Sputtering-Reference-Cited by-同舟云学术

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Design and Analysis of a New Excitation Structure for Magnetron Sputtering

Published:2024 Issue: Volume:12 Page:70792-70809
ISSN:2169-3536
Container-title:IEEE Access
language:
Short-container-title:IEEE Access

Author:

Su Ze-da¹^ORCID,An Yue-Jun¹,An Hui¹,Lu Yan-Jun²,Deng Wen-Yu³^ORCID,Qi Li-Jun³,Li Ming⁴

Affiliation:

1. School of Electrical Engineering, Shenyang University of Technology, Shenyang, China

2. Shenyang KINGSEMI Company Ltd., Shenyang, China

3. Shenyang China North Vacuum Equipment Company Ltd., Shenyang, China

4. College of Control Science and Engineering, Bohai University, Jinzhou, China

Funder

Liaoning Provincial Science and Technology Program Project

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/6287639/10380310/10526228.pdf?arnumber=10526228

Reference30 articles.

1. Electronic Structure and Thermoelectric Properties of Mg2Sn Films Fabricated by Using Co-Sputtering Process With Stoichiometric Modification

2. Modification of Dye-Sensitized Solar Cells With Sputter-Deposited Titanium Dioxide Blocking Layer for Enhanced Photovoltaic Performance Under Different Illuminations

3. Structure, principle, and application of magnetic field-assisted pulsed laser deposition: An overview

4. Role of magnetic field and bias configuration on HiPIMS deposition of W films

5. 3D-Printed All-Metal Terahertz Multibeam Lens Antenna Based on Photonic Crystal

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