Recoverable Patterning of Macro-Assembled Graphene Nanofilms-Reference-Cited by-同舟云学术

Recoverable Patterning of Macro-Assembled Graphene Nanofilms

Published:2023 Issue: Volume:11 Page:102562-102571
ISSN:2169-3536
Container-title:IEEE Access
language:
Short-container-title:IEEE Access

Author:

Cao Xiaoxue¹,Lin Jiahao¹,Wu Shaoxiong¹,Bodepudi Srikrishna Chanakya¹^ORCID,Li Zongwen¹,Tian Feng¹,Li Zheng¹,Liu Xinyu¹^ORCID,Peng Li¹,Gao Chao²,Xu Yang¹^ORCID

Affiliation:

1. School of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, State Key Laboratory of Silicon and Advanced Semiconductor Materials, ZJU-UIUC Joint Institute, Zhejiang University, Hangzhou, China

2. Department of Polymer Science and Engineering, MOE Key Laboratory of Macromolecular Synthesis and Functionalization, International Research Center for X Polymers, Zhejiang University, Hangzhou, China

Funder

National Natural Science Foundation of China

National Key Research and Development Program of China

China Postdoctoral Science Foundation

Natural Science Foundation of Zhejiang Provincial

Fundamental Research Funds for the Central Universities

Zhejiang University (ZJU) Micro-Nano Fabrication Center

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

General Engineering,General Materials Science,General Computer Science,Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx7/6287639/10005208/10252064.pdf?arnumber=10252064

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5. Work function engineering of single layer graphene by irradiation-induced defects