Field Emission Tip Array Fabrication Utilizing Geometrical Hindrance in the Oxidation of Si-Reference-Cited by-同舟云学术

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Field Emission Tip Array Fabrication Utilizing Geometrical Hindrance in the Oxidation of Si

Published:2012-09 Issue:5 Volume:11 Page:999-1003
ISSN:1536-125X
Container-title:IEEE Transactions on Nanotechnology
language:
Short-container-title:IEEE Trans. Nanotechnology

Author:

Ke Sun ,Wei Zhang ,Biyun Li ,Jae Young Lee ,Ya-Hong Xie ,Schroeder T.,Katzer J.,Xinyu Wei ,Russell T. P.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Science Applications

Link

http://xplorestaging.ieee.org/ielx5/7729/6294481/06256738.pdf?arnumber=6256738

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Self-Aligned Formation and Positioning of Nanogap Templates;2023 IEEE Nanotechnology Materials and Devices Conference (NMDC);2023-10-22

3. Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching;Micromachines;2020-06-29

4. Oxidation sharpening of silicon tips in the atmospheric environment;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11

5. Broadband surface-enhanced coherent anti-Stokes Raman spectroscopy with high spectral resolution;Journal of Raman Spectroscopy;2017-05-31

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