A robust co-sputtering fabrication procedure for TiNi shape memory alloys for MEMS

Author:

Shih C.-L.,Lai B.-K.,Kahn H.,Phillips S.M.,Heuer A.H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Cited by 74 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Exploring the Influence of the Deposition Parameters on the Properties of NiTi Shape Memory Alloy Films with High Nickel Content;Coatings;2024-01-20

2. Three Axis Actuation of Moving Coil Type Electromagnetic MEMS Actuator for Optical Image Stabilization;2022 IEEE 35th International Conference on Micro Electro Mechanical Systems Conference (MEMS);2022-01-09

3. Nitinol-Based Shape-Memory Alloys;Shape Memory Composites Based on Polymers and Metals for 4D Printing;2022

4. Current global scenario of Sputter deposited NiTi smart systems;Journal of Materials Research and Technology;2020-11

5. Ni-Ti Akıllı Alaşım İnce Filmin Sıcaklığa Bağlı X-Ray Kırınımı ile Karakterizasyonu ve Faz Dönüşümü Tespiti;Bilecik Şeyh Edebali Üniversitesi Fen Bilimleri Dergisi;2019-09-02

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