Self-aligned chemically assisted ion-beam-etched GaAs/(Al,Ga)As turning mirrors for photonic applications-Reference-Cited by-同舟云学术

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Self-aligned chemically assisted ion-beam-etched GaAs/(Al,Ga)As turning mirrors for photonic applications

Published:1990 Issue:1 Volume:8 Page:39-41
ISSN:0733-8724
Container-title:Journal of Lightwave Technology
language:
Short-container-title:J. Lightwave Technol.

Author:

Appelman H.,Levy J.,Pion M.,Krebs D.,Harding C.,Zediker M.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Atomic and Molecular Physics, and Optics

Link

http://xplorestaging.ieee.org/ielx1/50/1735/00045927.pdf?arnumber=45927

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Submicron Etched Beam Splitters Based on Total Internal Reflection in GaAs–AlGaAs Waveguides;Journal of Lightwave Technology;2010-07

2. A Monolithic All-Optical Push–Pull Wavelength Converter;IEEE Photonics Technology Letters;2007-11

3. Multimode-Interference-Coupled Ring Resonators Based on Total-Internal-Reflection Mirrors;Japanese Journal of Applied Physics;2007-01-10

4. The use of titanium and titanium dioxide as masks for deep silicon etching;Smart Materials and Structures;2005-12-13

5. Focusing integrated mirrors realized by silver ion-exchange: application to laser Doppler velocimeter with ultrahigh spatial resolution;Integrated Optics: Devices, Materials, and Technologies IX;2005-03-31

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