Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition

Author:

Jin JidongORCID,Wrench Jacqueline S.,Gibbon James T.,Hesp David,Shaw Andrew,Mitrovic Ivona Z.,Sedghi Naser,Phillips Laurie J.,Zou Jianli,Dhanak Vinod R.,Chalker Paul R.,Hall Steve

Funder

U.K. Engineering and Physical Sciences Research Council

Capital for Great Technologies Grid Scale Energy Storage Program

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Advancements in Schottky Diode Technology: A Comprehensive Review;2023 7th International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech);2023-12-18

2. Role of deposition parameters on the properties of the fabricated heterojunction ZnS/p-Si Schottky diode;Physica Scripta;2022-04-01

3. Rectifying ZnO–Na/ZnO–Al aerogels p-n homojunctions;Journal of Materials Science: Materials in Electronics;2022-02-18

4. Voltage- and Frequency-Dependent Electrical Characteristics and Interface State Density of Ni/ZnO Schottky Diodes;Acta Physica Polonica A;2022-02

5. Growth of ZnO thin films at low temperature by plasma-enhanced atomic layer deposition using H2O and O2 plasma oxidants;Journal of Materials Science: Materials in Electronics;2021-07-09

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