Interfacial Resonance States-Induced Negative Tunneling Magneto-Resistance in Orthogonally Magnetized CoFeB/MgO/CoFeB

Author:

Huang Puyang1ORCID,Chen Aitian2ORCID,Dong Jianting3,Wu Di4,Liu Xinqi5,Zhi Zhenghang1,Liu Jiuming1,Lee Albert4,Fang Bin2,Zhang Jia3,Zhang Xi-Xiang2ORCID,Kou Xufeng1ORCID

Affiliation:

1. School of Information Science and Technology, ShanghaiTech University, Shanghai, China

2. Physical Science and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi Arabia

3. School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan, China

4. Suzhou Inston Technology Company Ltd., Suzhou, China

5. ShanghaiTech Laboratory for Topological Physics, ShanghaiTech University, Shanghai, China

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Major Project of Shanghai Municipal Science and Technology

Shanghai Engineering Research Center of Energy Efficient and Custom AI IC

ShanghaiTech Quantum Device and Soft Matter Nano-fabrication Labs

King Abdullah University of Science and Technology (KAUST) through the KAUST Office of Sponsored Research

Shanghai Rising-Star Program and the Open Fund of the State Key Laboratory of Infrared Physics

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

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