Three-Orders Improvement of Endurance in Hafina Based MFS Capacitor through CF4 Plasma Pre-Treatment-Reference-Cited by-同舟云学术

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Three-Orders Improvement of Endurance in Hafina Based MFS Capacitor through CF4 Plasma Pre-Treatment

Published:2021-04-08 Issue: Volume: Page:
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Container-title:2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
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Author:

Lv Shuxian,Wang Yan,Gao Zhaomeng,Dang Zhiwei,Jiang Pengfei,Yuan Peng,Luo Qing,Zhao Shengjie,Lv Hangbing

Funder

National Natural Science Foundation of China

Chinese Academy of Sciences

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9420829/9420830/09420860.pdf?arnumber=9420860

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of CF₄/O₂ Plasma Passivation on Endurance Performance of Zr-Doped HfO₂ Ferroelectric Film;IEEE Electron Device Letters;2023-05

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