Two dimensional modeling of dual material double gate TFET in stacked hetero-dielectrics with split high-K materials
Author:
Affiliation:
1. National Institute of Technology Mizoram, Chaltlang,Department of ECE,Aizawl,India,796012
2. Techno International New Town,Department of ECE,Kolkata,India,700156
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10032824/10032825/10032942.pdf?arnumber=10032942
Reference27 articles.
1. Novel Attributes of a Dual Material Gate;transistor,2011
2. 2-D Analytical Modeling of the Electrical Characteristics of Dual-Material Double-Gate TFETs With a SiO2/HfO2 Stacked Gate-Oxide Structure
3. An Analytical Model for Tunnel Barrier Modulation in Triple Metal Double Gate TFET
4. Design and Analysis of Triple Metal Vertical TFET Gate Stacked with N-Type SiGe Delta-Doped Layer
5. Analytical Modeling of a Triple Material Double Gate TFET with Hetero-Dielectric Gate Stack
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