Si MOSFET fabrication using focused ion beams-Reference-Cited by-同舟云学术

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Si MOSFET fabrication using focused ion beams

Published:1984-09 Issue:9 Volume:31 Page:1186-1189
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Kubena R.L.,Lee J.Y.-M.,Jullens R.A.,Brault R.G.,Middleton P.L.,Stevens E.H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31906/01483971.pdf?arnumber=1483971

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanobiotechnology: An Engineer's Foray into Biology;Advances in Computers;2007

2. Maskless fabrication of JFETs via focused ion beams;Solid-State Electronics;2004-10

3. Modelling of physical processes in ion lithography;Thin Solid Films;1992-07

4. The Physics of Ion-Beam Lithography;The Physics of Submicron Lithography;1992

5. Ion Lithography and Focused Ion Beam Implantation;Handbook of Vlsi Microlithography;1991

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