Author:
Jain P.K.,Neureuther A.R.,Oldham W.G.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
11 articles.
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1. Techniques and Tools for Optical Lithography;Handbook of VLSI Microlithography;2001
2. Simulation of two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata;Modelling and Simulation in Materials Science and Engineering;1995-09-01
3. TECHNIQUES AND TOOLS FOR OPTICAL LITHOGRAPHY;Handbook of Vlsi Microlithography;1991
4. Effects of partial coherence on contact hole projection lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-05
5. Optical Exposure;Semiconductor Lithography;1988