Transient behavior of spin-coated resist film thickness based on invariance of viscous fluid under similarity transformation-Reference-Cited by-同舟云学术

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Transient behavior of spin-coated resist film thickness based on invariance of viscous fluid under similarity transformation

Published:1986-09 Issue:9 Volume:33 Page:1263-1269
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Matsuba I.,Matsumoto K.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31956/01485873.pdf?arnumber=1485873

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of ramping-up rate on film thickness for spin-on processing;Journal of Materials Science: Materials in Electronics;2005-11

2. Developer temperature effect on negative deep ultraviolet resists: Characterization, modeling, and simulation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11

3. Infrared observation of evaporative cooling during spin-coating processes;Optical Engineering;1995-06-01

4. Mathematical modeling of the process of formation of thin coatings by centrifuging with the aim of determining an efficient regime;Journal of Engineering Physics and Thermophysics;1994-05

5. Film/substrate/vacuum-chuck interactions during spin-coating;Optical Engineering;1992

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