Post-Deposition Annealing Effects on Ferromagnetic CoFeB Thin Films-Reference-Cited by-同舟云学术

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Post-Deposition Annealing Effects on Ferromagnetic CoFeB Thin Films

Published:2018-10 Issue:10 Volume:54 Page:1-7
ISSN:0018-9464
Container-title:IEEE Transactions on Magnetics
language:
Short-container-title:IEEE Trans. Magn.

Author:

O'Dell Ryan A.^ORCID,Phillips Adam B.^ORCID,Georgiev Daniel G.,Jones John G.^ORCID,Brown Gail J.,Heben Michael J.^ORCID

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/20/8467393/08439104.pdf?arnumber=8439104

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of interfacial oxygen diffusion on the magnetic properties and thermal stability of Pd/CoFeB/Pd/Ta heterostructure;Journal of Alloys and Compounds;2024-12

2. Influence of growth temperature on the magnetization dynamics of sputtered CoFeB thin films on various substrates and their microwave device functionality;Journal of Alloys and Compounds;2024-06

3. Improvement of high-frequency magnetic properties of CoFeB thin film using oblique deposition for spin wave electronic devices;Journal of Materials Science: Materials in Electronics;2024-02

4. Ferromagnetic resonance damping mechanisms in CoFeB thin films with Cr substitution;Physical Review B;2023-09-01

5. Annealing dependence on magnetization dynamics and two-magnon scattering in Co40Fe40B20 thin films;Thin Solid Films;2023-08

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