A Two-Dimensional Etching Profile Simulator: ESPRIT-Reference-Cited by-同舟云学术

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A Two-Dimensional Etching Profile Simulator: ESPRIT

Published:1987-05 Issue:3 Volume:6 Page:417-422
ISSN:0278-0070
Container-title:IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
language:en
Short-container-title:IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst.

Author:

Yamamoto S.,Kure T.,Ohgo M.,Matsuzawa T.,Tachi S.,Sunami H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software

Link

http://xplorestaging.ieee.org/ielx5/43/28441/01270287.pdf?arnumber=1270287

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Consideration of local shadowing and ion beam voltage effects in the prediction of a surface evolving under ion milling;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2000-01

2. CAD challenges for microsensors, microactuators, and microsystems;Proceedings of the IEEE;1998

3. Model for ion-initiated trench etching;IEEE Transactions on Plasma Science;1997-06

4. Simulation study of micro-loading phenomena in silicon dioxide hole etching;IEEE Transactions on Electron Devices;1997-05

5. A high-speed 2-D topography simulator based on a pixel model;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;1997-04

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