Sub-10-nm Size and Sub-40-nm Pitch Metal Dot Patterning for Low-Cost Bit Patterned Media Application-Reference-Cited by-同舟云学术

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Sub-10-nm Size and Sub-40-nm Pitch Metal Dot Patterning for Low-Cost Bit Patterned Media Application

Published:2014-05 Issue:3 Volume:13 Page:496-501
ISSN:1536-125X
Container-title:IEEE Transactions on Nanotechnology
language:
Short-container-title:IEEE Trans. Nanotechnology

Author:

Tobing Landobasa Y. M.,Tjahjana Liliana,Zhang Dao Hua

Funder

A$^{*}$ STAR, Singapore

National Research Foundation, Singapore (NRF-G-CRP 2007-01)

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Science Applications

Link

http://xplorestaging.ieee.org/ielx7/7729/6810833/06747299.pdf?arnumber=6747299

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reliable Fabrication of High Aspect Ratio Plasmonic Nanostructures Based on Seedless Pulsed Electrodeposition;Advanced Materials Technologies;2018-10-17

2. Combining sonicated cold development and pulsed electrodeposition for high aspect ratio sub-10 nm gap gold dimers for sensing applications in the visible spectrum;Nanoscale;2018

3. New processes associated with electron-beam lithography for ultra-small resonators;SPIE Proceedings;2017-03-27

4. Vertical growth of plasmonic nanostructures via electrodeposition on a conductive oxide;Procedia Engineering;2017

5. Observation of the Kinetic Inductance Limitation for the Fundamental Magnetic Resonance in Ultrasmall Gold v ‐Shape Split Ring Resonators;Advanced Optical Materials;2016-04-29

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