Funder
General Program of National Natural Science Foundation of China
Major Scientific Instrument Development Project of National Natural Science Foundation of China
National Science and Technology Major Project
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Computer Science Applications
Cited by
12 articles.
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1. 先进计算光刻;Laser & Optoelectronics Progress;2022
2. 计算光刻研究及进展;Laser & Optoelectronics Progress;2022
3. Lithographic exposure latitude aware source and mask optimization;10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies;2021-12-13
4. Exposure latitude aware source and mask optimization for extreme ultraviolet lithography;Applied Optics;2021-10-15
5. Multi-objective adaptive source optimization for full chip;Applied Optics;2021-03-15