Parallel Algorithm Design and Optimization for Numerical Simulation Application of Ion Implantation in Silicon
Author:
Affiliation:
1. Hunan University,College of Computer Science and Electronic Engineering,Changsha,Hunan,China
2. The 48th Research Institute of China Electronic Technology Corporation,Changsha,Hunan,China
Funder
National Natural Science Foundation of China
Natural Science Foundation of Hunan Province
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10475889/10475881/10475925.pdf?arnumber=10475925
Reference17 articles.
1. Research on massively parallel algorithms for atomic-scale simulation of material irradiation damage;Chu,2023
2. A scalable parallel numerical simulation algorithm for three-dimensional semiconductor devices;Cheng;Computational physics,2012
3. A Generalized Low-Rank Double-Tensor Nuclear Norm Completion Framework for Infrared Small Target Detection
4. Hydrodynamic Model for Plasmonics: A Macroscopic Approach to a Microscopic Problem
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