Fourth-Order Reference Trajectories in Lithography Stages with Weakly-Damped Modes - a Frequency-Domain Perspective-Reference-Cited by-同舟云学术

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Fourth-Order Reference Trajectories in Lithography Stages with Weakly-Damped Modes - a Frequency-Domain Perspective

Published:2023-12-13 Issue: Volume: Page:8696-8701
ISSN:
Container-title:2023 62nd IEEE Conference on Decision and Control (CDC)
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Author:

Heertjes Marcel¹,Torres Jazmin Zenteno²,Al Janaideh Mohammad³

Affiliation:

1. Eindhoven University of Technology,Control Systems Technology group,Department of Mechanical Engineering,The Netherlands

2. ASML, Research mechatronics group,The Netherlands

3. Memorial University,Department of Mechanical Engineering,St. John's,Newfoundland

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10383192/10383193/10384162.pdf?arnumber=10384162

Reference25 articles.

1. Control of Wafer Scanners: Methods and Developments

2. Position Control in Lithographic Equipment [Applications of Control]

3. Jerk derivative feedforward control for motion systems

4. Fixed Structure Feedforward Controller Design Exploiting Iterative Trials: Application to a Wafer Stage and a Desktop Printer

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