Author:
Shuto K.,Kato K.,Hasegawa M.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Enhanced Polysilicon Thin‐Film Transistor Performance by Oxide Encapsulation;Journal of The Electrochemical Society;1991-03-01
2. Gate oxide integrity of MOS/SOS devices;IEEE Transactions on Electron Devices;1986-01
3. A pattern edge profile simulation for oblique ion milling;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1984-10