High-density electron-beam-fabricated CCD memory components-Reference-Cited by-同舟云学术

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High-density electron-beam-fabricated CCD memory components

Published:1980-08 Issue:8 Volume:27 Page:1655-1665
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Hamilton J.M.,Nash J.G.,Henderson R.C.,Chen J.Y.,Leong D.M.,Cuk N.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31805/01480877.pdf?arnumber=1480877

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of Linear Image Sensor Toi Immunoassay Based Oin Turbidimetry of Antibody-Bound Latex Beads;Analytical Letters;1987-01

2. Geometry dependence of dark current in CCD's;IEEE Transactions on Electron Devices;1984-12

3. An interactive two-dimensional model for designing VLSI CCD's;IEEE Transactions on Electron Devices;1983-09

4. Barrier lowering in short-channel CCD's;IEEE Transactions on Electron Devices;1982-10

5. High-Density CCD Memories;VLSI Electronics Microstructure Science;1982

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