Enhancement of Selectivity for Chemical Mechanical Polishing by Ultra-High-Dose C and Si Ion Implantation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Enhancement of Selectivity for Chemical Mechanical Polishing by Ultra-High-Dose C and Si Ion Implantation

Published:2024 Issue: Volume:12 Page:407-414
ISSN:2168-6734
Container-title:IEEE Journal of the Electron Devices Society
language:
Short-container-title:IEEE J. Electron Devices Soc.

Author:

Yuan S.¹^ORCID,Omori K.¹,Yamaguchi T.¹,Ide T.²,Muranaka S.¹,Inoue M.¹

Affiliation:

1. Process Production Technology Division, Production and Technology Unit, Renesas Electronics Corporation, Ibaraki, Hitachinaka, Japan

2. Device Technology Division, Production and Technology Unit, Renesas Electronics Corporation, Ibaraki, Hitachinaka, Japan

Funder

Renesas Electronics Corporation

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/6245494/10416702/10454590.pdf?arnumber=10454590

Reference30 articles.

1. A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging

2. Integrating high-k/metal gates: Gate-first or gate-last?;Hoffman;Solid State Technol.

3. 45nm High-k + metal gate strain-enhanced transistors

4. Gate first or gate last: Technologist debate high-k;Lammers;Semicond. Int.,2010

5. Chemical mechanical polish: The enabling technology

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP