Author:
Bing-Yue Tsui ,Chih-Wei Chen ,Shien-Ming Huang ,Shyue-Shyh Lin
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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1. Single mask dual damascene processes;Microelectronic Engineering;2008-03