Development of a robust low-cost system for substrate preparation and growth of high quality MoS<sub>2</sub> thin films-Reference-Cited by-同舟云学术

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Development of a robust low-cost system for substrate preparation and growth of high quality MoS₂ thin films

Published:2023-08-28 Issue: Volume: Page:
ISSN:
Container-title:2023 37th Symposium on Microelectronics Technology and Devices (SBMicro)
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Author:

Assahi Flavio¹,Ider João¹,Oliveira Adhimar¹,Rubinger Carla¹,Rubinger Rero¹

Affiliation:

1. Universidade Federal de Itajubá,Instituto de Física e Química,Itajubá,Minas Gerais,Brazil

Funder

EMI

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10302454/10302463/10302520.pdf?arnumber=10302520

Reference14 articles.

1. Effect of ultraviolet/ozone treatment on the surface and bulk properties of poly(dimethyl siloxane) and poly(vinylmethyl siloxane) networks;özçam;Polymer,2014

2. Density of silanol groups on the surface of silica precipitated from a hydrothermal solution

3. Surface chemical heterogeneity modulates silica surface hydration

4. Advances in Silicon Science;owen;Silicone Surface Science Volume 4 Silanes and Siloxanes as Coupling Agents to Glass A Perspective,2012

5. Feeder-free culture for mouse induced pluripotent stem cells by using UV/ozone surface-modified substrates

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