Author:
Nasuno H.,Suzuki H.,Haga A.,Fujimura T.,Yamane K.
Publisher
The Magnetics Society of Japan
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Magnetic field distribution of shadow mask and its influence on electron trajectory.
2. 2) S. B. Saffod and M. D. Obara: IEEE National Symposium on EMC (1989), Session5C, pp, 315-319.
3. Magnetic field distribution of shadow mask having a magnetic circuit around a frame periphery and its affection to the electron beam trajectory.
4. 4) 奈須野,鈴木,芳賀:電気学会全国大会 (1991), 1710.
5. 5) R. C. Alig and R. J. D'Amato: Proceeding of SID, Vol. (April 1989), pp. 287∼296.
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