Hydrogen Retention Behavior in Boron Films Affected by Impurities Introduced by Hydrogen Plasma Exposure in the LHD-Reference-Cited by-同舟云学术

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Hydrogen Retention Behavior in Boron Films Affected by Impurities Introduced by Hydrogen Plasma Exposure in the LHD

Published:2012 Issue:0 Volume:7 Page:2401157-2401157
ISSN:1880-6821
Container-title:Plasma and Fusion Research
language:en
Short-container-title:Plasma and Fusion Research

Author:

MATSUOKA Katsushi¹,KOBAYASHI Makoto¹,KAWASAKI Kiyotaka¹,FUJISHIMA Tetsuo¹,MIYAHARA Yuto¹,ASHIKAWA Naoko²,NISHIMURA Kiyohiko²,SAGARA Akio²,OYA Yasuhisa¹,OKUNO Kenji¹

Affiliation:

1. Radioscience Research Laboratory, Faculty of Science, Shizuoka University

2. National Institute for Fusion Science

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Subject

Condensed Matter Physics

Link

https://www.jstage.jst.go.jp/article/pfr/7/0/7_2401157/_pdf

Reference15 articles.

1. [1] N. Noda et al., J. Nucl. Mater. 266, 234 (1999).

2. [2] K. Nishimura et al., J. Nucl. Mater. 337, 431 (2005).

3. [3] K. Nishimura et al., J. Nucl. Mater. 79, 1216 (2003).

4. [4] M. Oyaidzu et al., Appl. Sur. Sci. 244, 240 (2005).

5. [5] A. Yoshikawa et al., J. Nucl. Mater. 367, 1527 (2007).

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