Laser Production of Extreme Ultraviolet Light Source for the Next Generation Lithography Application
Author:
Affiliation:
1. Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, Suita, Osaka, Japan
2. Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka, Japan
Publisher
Japan Society of Plasma Science and Nuclear Fusion Research
Subject
Condensed Matter Physics
Link
http://www.jstage.jst.go.jp/article/pfr/4/0/4_0_048/_pdf
Reference31 articles.
1. [1] V. Bakshi, ed., EUV Sources for Lithography (SPIE Press, Bellingham, WA, 2005), ISBN 0-8194-5845-7.
2. Conversion efficiencies from laser‐produced plasmas in the extreme ultraviolet regime
3. [3] M. Richardson, G.-S. Koay, K. Takenoshita, C. Keyser and M. Al-Rabban, J. Vac. Sci. Technol. B 22, 785 (2004).
4. [4] Y. Shimada, H. Nishimura, M. Nakai, K. Hashimoto, M. Yamaura, Y. Tao, K. Shigemori, T. Okuno, K. Nishihara, T. Kawamura et al., Appl. Phys. Lett. 86, 051501 (2005).
5. Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas
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