1. [1] Y. Aoyama, M. Nakajima and K. Horioka, Phys. Plasmas 16, 110701 (2009).
2. [2] T. Sodekoda, H. Kuwabara, M. Masuda et al., Proc. SPIE 9048, Extreme Ultraviolet Lithography V, 904824 (2014).
3. [3] H. Kuwabara, T. Sodekoda, A. Tokuchi et al., IEEJ Transactions on Fundamentals and Materials, (submitted).