Perspective On Plasma Technology Employing Pulsed High Voltage Topologies-Reference-Cited by-同舟云学术

Perspective On Plasma Technology Employing Pulsed High Voltage Topologies

Published:2020-12-30 Issue: Volume: Page:138-144
ISSN:
Container-title:Innovations in Information and Communication Technology Series
language:en
Short-container-title:IICT

Author:

R Senthil Kumar¹,K Mohanasundaram²,S Harshavardhan Naidu¹

Affiliation:

1. Vel Tech High Tech Dr.Rangarajan Dr.Sakunthala Engineering College, India

2. KRP Institute of Engineering and Technology, India

Abstract

Versatility of the plasma technology has grabbed its application in a board field starting from the field dealing with microorganism to space science, the primary requirement the technology initiates with the generation of pulsed high voltage of various range as per the application it varies from 0.1-100 KV/cm. the article bestows the evolution and classification of pulsed HV after a comprehensive review of various topologies employed for plasma technologies, it provide a comparative study of various general topologies with an insight of it merits and demerits. Spot light is being showered over the evolution opted by the topologies as the solution for the issues faced mainly back corona effect and effect on line due the harmonics pumped by the pulsed HV generators.

Publisher

IJAICT India Publications

Link

http://www.ijaict.com/Book%20Series/iictseries/books/book2020/abstract/pdf/10.46532@978-81-950008-1-4_029.pdf

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