BEHAVIOR OF THE Ti-Zr-Ni THIN FILM CONTAINING QUASICRYSTALLINE AND APPROXIMANT PHASES UNDER RADIATIVE-THERMAL ACTION IN TRANSITION MODES-Reference-Cited by-同舟云学术

BEHAVIOR OF THE Ti-Zr-Ni THIN FILM CONTAINING QUASICRYSTALLINE AND APPROXIMANT PHASES UNDER RADIATIVE-THERMAL ACTION IN TRANSITION MODES

Published:2020-04-03 Issue: Volume: Page:3-8
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Container-title:Problems of Atomic Science and Technology
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Malykhin S.V.,Makhlai V.A.,Surovitskiy S.V.,Garkusha I.E.,Herashchenko S.S.,Kondratenko V.V.,Kopylets I.A.,Zubarev E.N.,Borisova S.S.,Fedchenko A.V.

Abstract

X-ray diffraction and SEM microscopy were used to study the structural and phase changes in a thin film obtained by magnetron sputtering of a Ti52Zr30Ni18 target (at.%) on a steel substrate under the radiation-thermal influence of pulsed hydrogen plasma on an QSPA Kh-50 accelerator. A technique has been worked out for the formation of the quasicrystalline and crystal-approximant phases as a result of high-speed quenching using pulsed action with a heat load of 0.6 MJ/m2. The changes in the contents of these phases as well as in their structure and substructure parameters were studied during isothermal vacuum annealing at a temperature of 550 °C and also as a result of irradiation with 5 plasma pulses in the range of heat load from 0.1 to 0.4 MJ/m2. The quasicrystalline phase was found to be resistant to irradiation with hydrogen plasma.

Publisher

Problems of Atomic Science and Technology

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