Comparative Investigation of Interfacial Characteristics between HfO2/Al2O3 and Al2O3/HfO2 Dielectrics on AlN/p-Ge Structure
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Published:2019-08-31
Issue:8
Volume:29
Page:463-468
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ISSN:1225-0562
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Container-title:Korean Journal of Materials Research
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language:
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Short-container-title:Korean. J. Mater. Res.
Author:
Kim Hogyoung, ,Yun Hee Ju,Choi Seok,Choi Byung Joon
Funder
Ministry of Education
Publisher
The Materials Research Society of Korea
Subject
General Materials Science