Effects of RF Power, Substrate Temperature and Gas Flow Ratio on the Mechanical Properties of WCxFilms Deposited by Reactive Sputtering
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Published:2005-10-01
Issue:10
Volume:15
Page:621-625
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ISSN:1225-0562
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Container-title:Korean Journal of Materials Research
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language:en
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Short-container-title:Korean Journal of Materials Research
Author:
Park Y. K.,Lee C. M.
Publisher
The Materials Research Society of Korea
Subject
General Materials Science