Determination of refractive indices of materials in modeling multilayer mirrors

Author:

Sergienko A. A.1,Pushkin D. B.1,Konotopov P. A.2,Cheremnykh A. D.1

Affiliation:

1. National Research Technological University «MISIS»

2. JSC Scientific Research Institute NPO «LUCH»

Abstract

Thin-film coatings for optical elements are widely used in various industries. Antireflection coatings are used in display screens, photodetectors, fiber optic light guides, mirror coatings are used for telescopes, medical equipment, etc. One of the main goals in the production of thin-film coatings is to determine the refractive index and the choice of materials applied to optical products. We present the results of determining the refractive indices of materials used for the manufacture of multilayer mirrors with the desired spectral characteristics. In general, light reflection occurs at the interface between two materials, for example, glass and air. Dielectric films were obtained by high-frequency ion-beam sputtering of the target. It is shown that the refractive index of the SiO2 film must be repeatedly corrected to minimize systematic errors. The results obtained can be used in the production of high-precision optical systems for various industries, especially medicine, space instrumentation, aviation and others.

Publisher

TEST-ZL Publishing

Subject

Applied Mathematics,Mechanics of Materials,General Materials Science,Analytical Chemistry

Reference18 articles.

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2. Tikhonravov A., Trubetskov M., Amotchkina T. Optical Thin Films and Coatings. — Cambridge: Woodhead, 2018.

3. Semenov Z. V. Indirect method research optical thickness control of multilayer coatings in a wide spectral range / Interexpo Geo-Siberia. 2018. Vol. 5. N 2. P. 179 – 191.

4. Tikhonravov A., Trubetskov M., Kokarev M., et al. Influence of systematic errors in spectral photometric measurements on the determination of optical thin film parameters / Optical Interference Coatings, Optical Society of America. 2001. Paper TuD2. DOI: 10.1364/OIC.2001.TuD2

5. Burdovitsin V., Bakeev I. Karpov K., Ngon Kiki L., Oks E., Vizir A. Characteristics of a source for oxide coating deposition by the electron-beam evaporation of dielectric materials / Plasma. 2022. Vol. 5. N 2. P. 258 – 264. DOI: 10.3390/plasma5020020

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