Microarea Analysis of Surface Contaminations of GaAs Photocathode in Preparation Process-Reference-Cited by-同舟云学术

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Microarea Analysis of Surface Contaminations of GaAs Photocathode in Preparation Process

Published:2019 Issue:9 Volume:48 Page:925001
ISSN:1004-4213
Container-title:ACTA PHOTONICA SINICA
language:en
Short-container-title:光子学报

Author:

FANG Chengwei 方城伟,ZHANG Yijun 张益军,RONG Minmin 荣敏敏,QIAN Yunsheng 钱芸生,DAI Qingxin 戴庆鑫,SHI Feng 石峰,CHENG Hongchang 程宏昌,BAI Xiaofeng 拜晓峰

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Atomic and Molecular Physics, and Optics

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Activation experiment and spectral response properties analysis of graded-bandgap AlGaAs/GaAs electron-injection cathode;Optics Communications;2022-04

2. InGaAs光电阴极制备工艺中的原位光电子能谱;Acta Optica Sinica;2022

3. 改进“yo-yo”Cs/O交替激活方法对GaAs光阴极稳定性影响;ACTA PHOTONICA SINICA;2022

4. InGaAs Surface Cleaning Based on Scanning Focused XPS Technique;Acta Optica Sinica;2021

5. 超二代与三代像增强器低照度分辨力的比较;ACTA PHOTONICA SINICA;2021

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