4H-SiC压力敏感膜片的低损伤飞秒激光加工-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

4H-SiC压力敏感膜片的低损伤飞秒激光加工

Published:2023 Issue:1 Volume:52 Page:0114004
ISSN:1004-4213
Container-title:ACTA PHOTONICA SINICA
language:en
Short-container-title:光子学报

Author:

WAN Zehong 万泽洪,DENG Hongyang 邓鸿洋,LEI Yu 雷宇,TAO Guoyi 陶国裔,HU Hongpo 胡红坡,ZHOU Shengjun 周圣军

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Atomic and Molecular Physics, and Optics

Reference34 articles.

1. Temperature dependent electrical characteristics of Sn/p-Si Schottky diodes;E AYYILDIZ;Applied Surface Science,2005

2. I-V-T (current-voltage-temperature) characteristics of the Au/Anthraquinone/p-Si/Al junction device;Z ÇALDIRAN;Journal of Alloys and Compounds,2014

3. High speed and low roughness micromachining of silicon carbide by plasma etching aided femtosecond laser processing;Xudong FANG;Ceramics International,2020

4. A SiC MEMS resonant strain sensor for harsh environment applications;R G AZEVEDO;IEEE Sensors Journal,2007

5. Mechanical properties of a micron-sized SCS film in a high-temperature environment;T ANDO;Journal of Micromechanics and Microengineering,2006

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP