Influence of Optical System Aberration on Critical Dimension of EUV Lithography Imaging
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Published:2019
Issue:12
Volume:39
Page:1222001
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ISSN:0253-2239
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Container-title:Acta Optica Sinica
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language:en
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Short-container-title:光学学报
Author:
Ming Ruifeng 明瑞锋,Wei Yayi 韦亚一,Dong Lisong 董立松
Publisher
Shanghai Institute of Optics and Fine Mechanics
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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