Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film-Reference-Cited by-同舟云学术

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Femtosecond pulsed laser induced damage characteristics on Si-based multi-layer film

Published:2019 Issue:2 Volume:12 Page:371-381
ISSN:2095-1531
Container-title:Chinese Optics
language:en
Short-container-title:中国光学

Author:

ZHENG Chang-bin 郑长彬,SHAO Jun-feng 邵俊峰,LI Xue-lei 李雪雷,WANG Hua-long 王化龙,WANG Chun-rui 王春锐,CHEN Fei 陈飞,WANG Ting-feng 王挺峰,GUO Jin 郭劲

Publisher

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences

Subject

Atomic and Molecular Physics, and Optics

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Numerical and Experimental Study on Thermal Damage Induced by Medium—Infrared Laser;Photonics;2022-11-08

2. Analysis of photoelectric characteristics of a light-damaged schottky perovskite detector;Chinese Optics;2022

3. Theoretical analyses of physical characteristics of a silicon wafer using laser beams with different pulse widths;AOPC 2021: Advanced Laser Technology and Applications;2021-11-24

4. Study on the damage characteristics of 532 nm picosecond pulse laser to monocrystalline silicon;Chinese Optics;2021

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