Author:
Chen Wenxuan 陈文轩,Cao Qing 曹清,Cheng Changjie 程长杰,Li Chaoyue 李潮越,Zhu Jirui 朱吉瑞,Mao Yaxing 毛亚星
Publisher
Shanghai Institute of Optics and Fine Mechanics
Reference60 articles.
1. Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging;A de Beurs;Optics Express,2018
2. High resolution coherent diffractive imaging with a table-top extreme ultraviolet source;Dinh K ba;Journal of Applied Physics,2014
3. 光刻机照明光场强度分布校正技术研究;马晓喆;中国激光,2021
4. Correction technology for illumination field intensity profile in photolithography machine;H J Huang;Chinese Journal of Lasers,2021
5. 极紫外光刻光源的研究进展及发展趋势;林楠;激光与光电子学进展,2022