Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm-Reference-Cited by-同舟云学术

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Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

Published:2009 Issue:7 Volume:7 Page:601-604
ISSN:1671-7694
Container-title:Chinese Optics Letters
language:en
Short-container-title:中国光学快报

Author:

Gang Dai 戴罡,Yanbei Chen 陈彦北,Jian Lu 陆建,Zhonghua Shen 沈中华,Xiaowu Ni 倪晓武

Publisher

Shanghai Institute of Optics and Fine Mechanics

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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