Author:
ZHENG Xiao-yi 郑箫逸,YUAN shuai 袁 帅,CUI Xiao-peng 崔晓鹏,LIN Hong-tao 林鸿涛,CHEN Wei-tao 陈维涛,XUE Hai-lin 薛海林,SHAO Xi-bin 邵喜斌
Publisher
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Subject
Instrumentation,Signal Processing,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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1. Investigation on exposure Mura in TFT process;Chinese Journal of Liquid Crystal and Displays;2021
2. Research and improvement of dark corner Mura in TFT-LCD;Chinese Journal of Liquid Crystals and Displays;2020