ABLATION OF POLY(METHYL METHACRYLATE) BY A SINGLE PULSE OF SOFT X-RAYS EMITTED FROM Z-PINCH AND LASER-PRODUCED PLASMAS-Reference-Cited by-同舟云学术

ABLATION OF POLY(METHYL METHACRYLATE) BY A SINGLE PULSE OF SOFT X-RAYS EMITTED FROM Z-PINCH AND LASER-PRODUCED PLASMAS

Published:2002-02 Issue:01 Volume:09 Page:347-352
ISSN:0218-625X
Container-title:Surface Review and Letters
language:en
Short-container-title:Surf. Rev. Lett.

Author:

JUHA L.¹,KRÁSA J.¹,PRÄG A.¹,CEJNAROVÁ A.¹,CHVOSTOVÁ D.¹,ROHLENA K.¹,JUNGWIRTH K.¹,KRAVÁRIK J.²,KUBEŠ P.²,BAKSHAEV Yu. L.³,CHERNENKO A. S.³,KOROLEV V. D.³,TUMANOV V. I.³,TUMANOV M. I.⁴,BERNARDINELLO A.⁵,ULLSCHMIED J.⁶,BOODY F. P.⁷

Affiliation:

1. Institute of Physics, Czech Academy of Sciences, Na Slovance 2, 182 21 Prague 8, Czech Republic

2. Department of Physics, Faculty of Electrical Engineering, Czech Technical University, Technická 2, 166 27 Prague 6, Czech Republic

3. Russian Research Center "Kurchatov Institute," 123182 Moscow, Russia

4. Research Institute of Pulsed Systems, 115304 Moscow, Russia

5. Dipartimento di Fisica "G. Occhialini" and INFM, Università degli Studi di Milano Bicocca, Piazza della Scienza 3, 20126 Milano, Italy

6. Institute of Plasma Physics, Czech Academy of Sciences, Za Slovankou 3, 182 21 Prague 8, Czech Republic

7. Ion Light Technologies GmbH, Lessingstrasse 2c, 93077 Bad Abbach, Germany

Abstract

The efficiency of ablation induced in poly(methyl methacrylate) (PMMA) by single soft X-ray pulses emitted from Z-pinch and laser-produced plasmas was determined. X-ray ablation of PMMA was found to be less efficient than that of teflon (PTFE). Nonthermal effects of the radiation on the polymer structure play a key role in the mechanisms of the ablation, i.e. the ablation can be explained by the formation of radiation-chemical scissions of the polymer chain followed by blowoff of low-molecular fragment fluid into the vacuum. The most promising application of this phenomenon seems to be micropatterning/micromachining.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218625X02002257

Reference38 articles.

1. Submicron x‐ray lithography using laser‐produced plasma as a source

2. High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

3. Synchrotron radiation ablative photodecomposition and production of crystalline fluoropolymer thin films

4. O2Plasma Etch Rate Reduction on Synchrotron Radiation Exposed PMMA Film

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