TI-ION IMPLANTATION EFFECTS ON THE ELECTRICAL RESISTIVITY, HARDNESS AND MICROSTRUCTURE OF BRASS ALLOY

Abstract

Extensive progress in brass alloys has been done in surface properties and microstructure. Ti-ion implantation is studied for its effects on electrical resistivity, hardness and microstructure by using scanning electron microscopy, X-ray diffractometer, four-point probe apparatus and Vickers microhardness tester. Ion distribution profile and stopping powers were calculated by Stopping and Range of Ions in Matter (SRIM) code. Nonuniformity in shape, and agglomeration of defects were observed at the surface in SEM micrographs. XRD analysis of (2 0 0) plane for crystallite size, strain, stress and dislocation density is also done. The peak intensity of (2 0 0) is found to be increased by increasing the ion fluence and tensile stresses were also found generated. Increase in the lattice parameter values from 3.681 Å to 3.686 Å appeared as a change in crystallite size, which, in turn, caused an increase in hardness. An increment in electrical resistivity from 7.9[Formula: see text][Formula: see text] to 18[Formula: see text][Formula: see text] (127.85%) is also observed. For a maximum ion fluence of [Formula: see text] ions/cm2, the surface turned out to be amorphous, which helped in making the brass more reliable in its practical usage.