FORMULAE FOR MAXIMUM ESCAPE DEPTH OF REDIFFUSED ELECTRONS AND BACKSCATTERING COEFFICIENT OF METAL FILMS

Abstract

Based on the experimental maximum escape depth [Formula: see text], [Formula: see text] of rediffused electrons from atomic number [Formula: see text] metal at incident energy of primary electron [Formula: see text], the relationship among [Formula: see text], [Formula: see text], [Formula: see text] and [Formula: see text] in the energy range of 9.3[Formula: see text]keV[Formula: see text]40[Formula: see text]keV was obtained and proved to be true by experimental data. According to the experimental results of rediffused electrons, the characteristics of secondary electron emission, relationships among parameters of rediffused electrons and the main processes of rediffused electrons emission, the formula for [Formula: see text] backscattering coefficient [Formula: see text], [Formula: see text], [Formula: see text] of [Formula: see text] metal films with film thickness [Formula: see text] as a function of [Formula: see text], Z and was deduced, and the results were analyzed. It is concluded that the deduced formula for [Formula: see text], [Formula: see text], [Formula: see text] can be used to calculate [Formula: see text], [Formula: see text], [Formula: see text] in the energy range of 9.3[Formula: see text]keV[Formula: see text]40[Formula: see text]keV. The secondary electron yield [Formula: see text] from thin films are applied in more and more fields such as electronic information technology, accelerator and space flight, and [Formula: see text], Z, [Formula: see text] is an important parameter of [Formula: see text] from [Formula: see text] metal films. So deducing the formula for [Formula: see text], [Formula: see text], [Formula: see text] in this study is necessary.