GROWTH AND ELECTRICAL PROPERTIES OF (Bi, Nd)4Ti3O12 THIN FILMS

Author:

YANG CHANGHONG1,WANG ZHUO1,PAN DONGYING1,HAN JIANRU1,LI QINGXIA2,WANG JIANHUA2

Affiliation:

1. State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, P. R. China

2. Shandong Metallurgical Research Institute, Jinan 250014, P. R. China

Abstract

Neodymium-doped Bi 4 Ti 3 O 12 ( Bi 3.15 Nd 0.85 Ti 3 O 12) thin films have been synthesized by metalorganic solution decomposition and deposited on SiO 2/ p - Si (111) substrate by spin coating. The structural characteristic and crystallization of the films were examined by X-ray diffraction and atomic force microscope. The insulating property, dielectric constant and dissipation loss were found to be dependent on the annealing temperature. Nonhysteretic C – V curves at various frequencies were also collected. The films in the ON and OFF states were relatively stable.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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