SYNCHROTRON RADIATION PHOTOEMISSION AND INFRARED SPECTROSCOPY STUDY OF ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ON Si(100)(2 × 1)

Abstract

We have used synchrotron radiation photoemission (SR-PES) and infrared absorption spectroscopy (IRAS) to investigate in situ the adsorption and decomposition of SiH 2 Cl 2 on Si (100)(2 × 1). Si 2p core level photoemission spectra and IRAS spectra in the Si–H stretching vibration region of the surface exposed to SiH 2 Cl 2 at room temperature have been measured to elucidate how SiH 2 Cl 2 adsorbs on the surface. PES data show that monochloride (SiCl) and hydride species ( SiH x) are generated upon dichlorosilane adsorption. IRAS data demonstrate that at initial stages of SiH 2 Cl 2 adsorption, the monohydride, the dihydride ( SiH 2) and the Cl-substituted hydride (–SiHCl) are populated on the surface. Comparison of PES and IRAS data indicates that Si–Cl bonds of the SiH 2 Cl 2 molecule are readily ruptured upon adsorption of dichlorosilane on the Si (100)(2 × 1).